|99.9%, 99.95%, 99.99%, 99.995%, 99.999%
|Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) is a leading provider of Gallium Oxide-Magnesium Oxide Sputtering Targets, offering exceptional quality products at highly competitive prices. With a focus on innovation and precision, SAM’s targets are designed to meet the demands of the most demanding applications in the field of nanotechnology and thin-film deposition.
Stanford Advanced Materials (SAM) proudly offers our Gallium Oxide-Magnesium Oxide Sputtering Targets, a cutting-edge solution for your thin-film deposition needs. These targets are precision-engineered from the highest-quality materials, ensuring exceptional performance and reliability. With their unique composition of Gallium Oxide and Magnesium Oxide, these targets offer a range of beneficial properties, including excellent electrical insulation, high refractive index, and excellent corrosion resistance. They are suitable for various applications, such as optical coatings, dielectric films, and other thin-film deposition processes that require precise control of material properties. Whether a research scientist or a manufacturing professional, SAM’s Gallium Oxide-Magnesium Oxide Sputtering Targets will provide you with the quality and performance you demand.
|Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
In the field of optics, Gallium Oxide-Magnesium Oxide Sputtering Targets are used to create coatings for mirrors, lenses, and other optical components. These coatings have high refractive indices and are highly transparent in the visible spectrum, making them ideal for a range of optical applications.
In electronics, these targets are used in the production of thin-film coatings for circuit boards, semiconductors, and other microelectronic devices. The coatings can serve as insulators or conductors, depending on their composition, and help improve the performance and reliability of these devices.
In solar energy, Gallium Oxide-Magnesium Oxide Sputtering Targets are used to create anti-reflective coatings for solar cells. These coatings help increase the absorption of sunlight by the cells, thereby improving their efficiency in converting solar energy into electricity.
In addition to these applications, these targets are also used in research and development, where they can be deposited on a range of substrates to study their physical and chemical properties.
Our Gallium Oxide-Magnesium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Gallium Oxide-Magnesium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.