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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0956 Barium Stannate Sputtering Target, BaSnO3

Chemical Formula BaSnO3
Catalog No. ST0956
CAS Number 12009-18-6
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Providing optimal performance in semiconductor applications, Stanford Advanced Materials (SAM) offers the Barium Stannate Sputtering Target crafted for precision. This high-quality thin film deposition material ensures superior thin film quality, making it an ideal choice for advanced electronic device manufacturing.   Choose this specialized sputtering target to enhance your thin film deposition with precision and excellence.

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Barium Stannate Sputtering Target Description

Barium Stannate Sputtering Target is a specialized material used in the sputtering process for thin film deposition. Sputtering is a technique where high-energy ions bombard a target material, causing the release of atoms from the target surface. These atoms then deposit onto a substrate, forming a thin film with specific properties.

Barium Stannate is a material renowned for its exceptional properties. The perovskite-like crystal structure contributes to its outstanding electrical conductivity, making it highly sought after in semiconductor technology and electronic device manufacturing. Beyond its conductivity, Barium Stannate shows promise in optoelectronics, where it can be utilized in crafting photonic devices and lasers. Its chemical and thermal stability further enhance its reliability, enabling applications in challenging environments. In essence, the unique properties of Barium Stannate position it as a key player in advancing semiconductor technology and optoelectronics, holding potential for exciting innovations in the future.

Related Product: Barium Titanate Sputtering Target, Barium Zirconate Sputtering Target

Barium Stannate Sputtering Target Specifications

Compound Formula BaSnO3
Molecular Weight 304.03
Appearance White Target
Melting Point
Density 7.6 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Barium Stannate Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Barium Stannate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Barium Stannate Sputtering Target Application

  1. Conductivity: Barium Stannate Sputtering Targets stand out for their excellent conductivity for semiconductor technology and electronic device manufacturing. Their special crystal structure is the key to their conductivity.
  2. Optical properties: With their impressive optical properties, Barium Stannate Sputtering Targets show great potential in the field of optoelectronics. They can be used to prepare optical components such as photovoltaic devices and lasers.
  3. Chemical and thermal stability: Barium Stannate Sputtering Targets exhibit excellent chemical and thermal stability, making them reliable in high-temperature environments and complex chemical conditions and suitable for a wide range of applications.
  4. Thin film deposition: As a sputtering target, Barium Stannate can be used for precision thin film deposition, ensuring uniform and high-quality films in the preparation of electronic devices.
  5. Engineered: Barium Stannate Sputtering Targets are carefully designed and engineered to ensure excellent performance and reliability in research and industrial applications.

Barium Stannate Sputtering Target Packaging

Our Barium Stannate Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Barium Stannate Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.