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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

MG2274 Magnesium Oxide Wafer Substrate

Catalog No. MG2274
Material MgO
Clear Aperture >95 %
Thickness/Diameter Tolerance ±0.05 mm

Stanford Advanced Materials (SAM) provides magnesium oxide wafer substrate in diameter from 2″ to 12″. We always choose prime grade and defect-free wafer as a substrate for growing high uniformity thermal oxide layer to meet your specific requirements.




Description

Magnesium Oxide Wafer Substrate Description

MgO wafer can be fabricated in round or square shape, with a SEMI flat or without flat, one side polished or two sides polished, size from 10 x10 mm to 2 “, thickness range from 0.4, 0.5, 1 to 2 mm, surface are epi polished with low surface roughness. We have twin free and defect-free magnesium oxide wafer substrates with various orientation <100>, <110> and <111>, and high precision surface finish, please contact us for more product information.

Magnesium Oxide Wafer Substrate Specifications

Materials

MgO

Orientation

<100> / <111> / <110> or others

Parallel

10″

Perpendicular

5′

Surface quality

10/5

Wavefront Distortion

λ/4@632 nm

Surface flatness

λ/8@632 nm

Clear Aperture

>95 %

Chamfer

<0.1×45°

Thickness/Diameter Tolerance

±0.05 mm

Maximum dimensions

dia 50×100 mm

Magnesium Oxide Wafer Substrate Application

Magnesium oxide wafer substrate products are used widely for HTSC (high-temperature superconductor) thin film coatings applications worldwide. There is also a growing amount of interest in using these substrates, because of their economic cost, for other applications that previously would not have justified the higher cost of MgO, such as for use as substrates for the III to V elements.

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Magnesium Oxide Wafer Substrate
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