Introduction Chemical vapor deposition is a coating method that is commonly used to produce thin films and coatings of very high quality. Gaseous reactants are usually used in this process. In chemical vapor deposition, you transport one or more volatile precursors to the reaction chamber. The volatile precursors usually decompose on a heated substrate surface...Continue Reading

Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are considered to be the most attractive surface coating technologies and have a wide range of applications in various industries. Let us compare these two methods in detail. Physical Vapor Deposition Chemical Vapor Deposition Definition Physical vapor deposition (PVD) is a series of vacuum deposition methods...Continue Reading