What is an AZO Sputtering Target? AZO sputtering targets are also referred to as aluminum-doped zinc oxide sputtering targets. Aluminum-doped zinc oxide is a transparent conducting oxide. This oxide is insoluble in water but is thermally stable. AZO sputtering targets are typically used for thin-film deposition. Doping is a process that involves intentionally adding impurities...Continue Reading

What is Pulsed Laser Deposition (PLD)? Pulse laser deposition is a method of physical vapor deposition. In this process, a high-power pulsed laser beam is centered on a target within the vacuum chamber. The laser beam vaporizes the target material and deposits it as a thin film on a substrate. The process involves evaporation, ablation,...Continue Reading

What is Hot Isostatic Pressing? Hot isostatic pressing is one of the methods popularly used to process chemical materials. In this method, a material is compressed in a furnace at temperatures between 1173 K to 2523 K and pressures between 100 to 200 MPa. It is quite similar to another process known as hot pressing....Continue Reading